Abstract
Low-energy ion beam bombardment induced self-assembly has been used to form various periodic nano-size wave-ordered structures (WOS). Such WOS can be used as hard etching masks to produce nanowire arrays, trenches etc., on other materials by means of traditional etching or ion sputtering. These periodic nano-size structures have a wide range of applications, including flat panel displays, optical electronics, and clean energy technologies (solar and fuel cells, lithium batteries). In order to achieve high throughput of the above processes, a large area RF-driven multicusp nitrogen ion source has been developed for the application of nitrogen ion beam induced surface modification. An integrated ion beam system, which can house either a large area RF-driven multicusp ion source or a commercially available microwave ion source (Roth & Rau AG Tamiris 400-f) have been designed, manufactured, assembled, and tested.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a call
