Abstract
AbstractFor a better understanding of the oxide growth and final film properties upon anodization of titanium in sulfuric and phosphoric acid containing electrolytes, the electrochemical behavior as studied by a.c. impedance was correlated to microstructural analysis (TEM, Raman). Chemical depth profiling of the films was performed with glow discharge optical emission spectroscopy (GDOES), XPS and RBS. The fitted capacitances and resistances from a.c. impedance measurements were greatly influenced by the ongoing crystallization as well as by film porosity as a function of increasing anodization potential. GDOES revealed a small sulfur contamination (with its maximum before the oxide–metal interface) upon anodization in 1 M H2SO4 and a significant phosphorus content throughout the oxides for films grown in 1 M H3PO4, showing an accumulation at the surface. Small impurities of carbon in all films as well as an accumulation of hydrogen at/after the interface oxide–metal were also observed. Quantification of the hydrogen content by elastic recoil detection analysis (ERDA) indicated a peak concentration of 20–30 at%. Copyright © 2006 John Wiley & Sons, Ltd.
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