Film deposition and surface modification using intense pulsed ion beams

Abstract

High-power pulsed ion beams have been used to ablate material for ultrahigh-rate film deposition and to treat the surfaces of alloys. Pulsed ion beams were provided by the high-power-density Gamble II facility at the Naval Research Laboratory [high voltage (∼900 keV), short pulse (60 ns)] and the lower-power-density Anaconda facility at Los Alamos National Laboratory [lower voltage (∼300 keV), longer pulse (400 ns)]. Peak film deposition rates after target ablation reached 1 mm/s. Films of pure Al, pure Ta, YBCO, and Ni–Zn ferrite were deposited on glass and single-crystal substrates, in some cases heated. The film deposition process was studied with framing photography, a bolometer, and other diagnostics to gain an understanding of the ablation, transport, and deposition steps. Stoichiometric deposition of multicomponent targets has been demonstrated. Film morphology remains poor, but has steadily improved, and our present understanding points the way to further improvement. Lower fluences (∼5 J/cm2) were used to investigate rapid thermal processing of metal surfaces for the enhancement of corrosion resistance. The results in this area have been negative, but here again the knowledge gained through these experiments allows us to propose directions for improvement.