Abstract
The effect of manufacturing and positioning errors and of system artefacts, such as supports, on the field uniformity in a Chang profile electrode system isstudied using a computational model. The Chang profile electrode is widely used in transverse discharge lasers. Computed field distributions on the electrode surface for a wide range of system errors and artefacts are presented; these permit the specification of tolerances and sensitivity to support structures to be determined for a practical laser system using Chang electrodes.
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