Abstract
The field emission properties of nanostructured carbon films deposited by cathodic vacuum arc have been investigated by measuring both the emission currents and the emission site density. The films have an onset field of 3 V/μm. The emission site density is viewed on a phosphor anode and it increases rapidly with applied field. It is assumed that the emission occurs from surface regions with a range of field enhancement factors but with a constant work function. The field enhancement factor is found to have an exponential distribution.
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