Abstract
Carbon nanotubes (CNTs) arrays were prepared by microwave plasma-enhanced chemical vapor deposition (MPCVD) method. Nickel layer of 7 nm in thickness on 100-nm thickness titanium nitride film was transformed into discrete islands after hydrogen plasma pretreatment. CNTs were then grown up on Ni-coated areas by MPCVD. Their field emission properties were studied and evaluated. From formulism analysis, superior CNT films with very low emission onset electric field, about 0.425 V/micron (at J =10 micro-A/cm<sup>2</sup>), are attained without post-deposition treatment. The large field amplification factor arising from small curvature radius of nanotube tips is responsible for good emission characteristics.
Sign-in/Register to access full text options 
Free) 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a call
