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Abstract
Diamond-like amorphous carbon (DAC) films were deposited for field-emission application using supermagnetron plasma by mixing N 2 or H 2 in i-C 4H 10 gas at the upper and lower electrode rf powers (UPRF/LORF) of 800 W/100–800 W. At an 800 W/800 W, the N 2 (0–80%) gas-mixed DAC films showed an emission threshold electric field ( E TH) of 19 V/μm. At the 800 W/100 W, the H 2 (20%) gas-mixed DAC film showed low E TH's of 13 V/μm, respectively. The moderate reduction of CC and CN double bonds by the decrease of LORF from 800 W to 100 W was found to be effective to lower E TH.
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