Abstract
Results of investigation of carbon films deposited with the use of gas-phase chemical reactions in the plasma of a dc discharge are presented. Films obtained at different parameters of the deposition process varied widely in their structure and phase composition, from polycrystalline diamond to graphite-like material. Comparative study of the structure and phase composition of the films using Raman spectroscopy, cathodoluminescence, electron microscopy, and diffractometry, as well as the obtained field electron emission characteristics, have shown that the threshold value of the electric field strength for electron emission decreases with a decrease in the size of diamond crystallites and growth of the fraction of non-diamond carbon. The lowest threshold fields (less than 1.5 V/µm) are obtained for films consisting mainly of graphite-like material. A model based on the experimental data is proposed, which explains the mechanism of field electron emission in carbon materials.
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