Abstract
An erbium-doped silica-on-silicon planar waveguide optical amplifier is described. The active core is a topographic guide formed from aluminophosphosilicate glass doped with erbium and ytterbium. The buffer is formed from silica deposited by thermal oxidation and the cladding from borophosphosilicate glass obtained by plasma-enhanced chemical vapor deposition. The use of low process temperatures allows relatively heavy doping and careful control of the core etching allows low background insertion losses to be obtained. Spontaneous emission and gain measurements are given and 5.4-dB fiber-device-fiber gain is demonstrated using a 5-cm-long chip pumped using a 980-nm laser diode at 175-mW pump power.
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