Abstract

By using femtosecond laser-ultrasonic, we demonstrate an approach to study the surface plasmon field optically excited in the interface between metal and a semiconductor thin film. By femtosecond impulsive excitation on gallium–nitride (GaN), different optical probe signals were observed when the impulse-excited nanoacoustic pulse propagated through the metal film and metal nanoslits. By analyzing the shape and temporal response of thus induced acousto-optical signals, our femtosecond laser-ultrasonic study not only reveals the plasmonic field distribution optically excited in the metal/substrate interface but also confirms that the penetration depth of surface plasmon field into the substrate agrees well with a simulation result.

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