Abstract
The porous silicon film surface region containing silver particles is studied by scanning electron microscopy and Raman spectroscopy. The porous silicon film is formed by metal-assisted etching of a single-crystal silicon substrate. It is found that the distribution of silver particles is controlled by the porous layer morphology. The formation of silver particles by chemical deposition results in certain smoothing of the por-Si film surface relief. In this case, the silicon crystallite structure does not change significantly.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
