Abstract
The porous silicon film surface region containing silver particles is studied by scanning electron microscopy and Raman spectroscopy. The porous silicon film is formed by metal-assisted etching of a single-crystal silicon substrate. It is found that the distribution of silver particles is controlled by the porous layer morphology. The formation of silver particles by chemical deposition results in certain smoothing of the por-Si film surface relief. In this case, the silicon crystallite structure does not change significantly.
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