Abstract
MD simulation was applied to study disordered NiPd alloy sputtering under normal and oblique incidence of Ar ions at energy E 0 = 0.1–20 keV. Energy dependences of NiPd alloys and their components sputtering were studied and discussed for various incidence angles of ions interacting with either disturbed or undisturbed top layers of surfaces. We revealed and explained the essential differences in energy dependences and positions of NiPd single crystal sputtering yield maxima in oblique and normal ion incidence.
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