Feasibility of two-dimensional die-level plasma process monitoring using spatially resolvable optical emission spectrometers

Abstract

We demonstrated the feasibility of die-level process monitoring using spatially resolvable optical emission spectrometers (SROESs) in a low-pressure plasma reactor. The spatially resolved Ar emission line intensities and their intensity ratios were obtained from uniformly generated and intentionally perturbed plasma by inserting conductors of known sizes at known locations. The sheath and perturbed plasma distributions were identified from the Ar emission line intensity and their intensity ratio in the lateral direction to the SROES installment orientation. However, the resolution in the axial direction was insufficient to identify the sheath and perturbed the plasma distribution. We propose the superimposition of measured plasma emission intensities from two perpendicularly aligned SROESs for die-level process monitoring. The insufficient axial resolution can be compensated for by the lateral resolution of another SROES, and die-level process monitoring using SROES can thus be realized.