Fatigue strength of the Cu/Si interface in nano-components

Abstract

The fracture behavior of the Cu/Si interface in a nano-cantilever specimen with a 200 nm-thick Cu film (Specimen-200), which possesses a nanometer-scale strain-concentrated region, is examined under a cyclic bending load. The fatigue strength is around GPa level owing to the high yield stress of the Cu nano-film and the deformation constraint associated with the neighboring hard materials. The S– N curve shows clear dependence of fatigue life on the applied stress in the high-stress range, Δ σ. Specimens with a 20 nm-thick Cu film (Specimen-20) are also investigated for comparison. The stress range in the fatigue fracture of Specimen-20 is higher than that of Specimen-200 for the same fatigue life. However, there is good coincidence in the Δ σ/ σ s ( σ s: strength in monotonic load) vs. N f (number of cycles to fracture) at high Δ σ. The S– N curves suggest the existence of a fatigue threshold (Δ σ w) at low Δ σ. The ratio of fatigue limit to the fracture stress in a monotonic loading, Δ σ w/ σ s, is large compared with the magnitude of bulk metal, which suggests the brittle behavior of the interface. Moreover, the fatigue limits have good coincidence with their yield stresses.