Abstract
The fatigue behavior of nanocrystalline Cu films on polydimethylsiloxane (PDMS) substrates was studied. It is revealed that the Cu films on wrinkled PDMS substrates exhibit ultrahigh fatigue resistance without electrical failure. The electrical resistance either remains constant during cyclic loading or slightly increases and rapidly reaches saturation, which is attributed to the buffering effect of wrinkle structures on crack initiation and the suppression effect of surface undulations on crack propagation. The film thickness-dependence of fatigue resistance is sensitive to the amount of the strain amplitude. The fatigue resistance increases with decreasing film thickness at small strain amplitudes because of higher strength and smaller local strain concentration, while the fatigue resistance first increases and then decreases as the film thickness increases at large strain amplitudes, which is related to the extrinsic deformation capability of Cu films.
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