Abstract
We report a new method for the fabrication of sub-10 nm nanopores in a fast single processstep. The pore formation is accomplished by exploiting the competition between sputteringand deposition in ion-beam-induced deposition (IBID) on a thin membrane. The porediameter can be controlled by adjusting the ion beam and gas exposure conditions. Thepore diameter is well below the limit that can be achieved by focused ion beam(FIB) milling alone. There is no need of preparation and successive treatments.Apart from simplicity and speed, this method offers an additional advantageof a broad choice of material and thickness of the deposit and the membrane.
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