Abstract

Epitaxial growth of CeO <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sub> buffer layers on biaxially textured (001) Ni tapes was studied using reel-to-reel pulsed laser deposition. Relationship between microstructure and deposition parameters was systematically studied in order to develop reliable long tape coating processes. Prior to buffer layer deposition, Ni tapes were in situ annealed in forming gas (97% argon + 3% hydrogen) under various pressures and tape speeds to accelerate reel-to-reel annealing processes. It was found that orientation and texture of CeO <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sub> buffer layers were sensitive to deposition parameters. X-ray diffraction analyses showed that CeO <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sub> buffer layers had pure (001) orientation at forming gas pressure of 5 mTorr and 700degC. Under optimized deposition conditions, highly (001) oriented CeO <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sub> buffer layers have been achieved at a high tape speed of 20-50 m/h. In-lane texture of CeO <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sub> buffer layers was 7 degree which was comparable to the value of Ni tapes.

Full Text
Paper version not known

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call

Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.