Abstract
Ti films sputtered on transparent fluorine-doped tin oxide glass substrates were anodized in fluoride-containing organic electrolyte in the presence of H 2O. In this work, anodic TiO 2 nanotubes (ATNs) as long as 9.2 ± 0.3 μm were obtained with high growth rate of 0.64 ± 0.3 μm min −1. We demonstrated the optimum anodization conditions for ATN growth on foreign substrates, were within the range of 0.3–0.5% (wt) NH 4F, with 3–5% (vol) H 2O at 60 V. XPS and ICP-MS were utilized to elucidate the increase of thickness and volume expansion obtained from the sputtered Ti film to their ATN forms. The ATN films exhibited excellent uniformity and adhesion to the substrates.
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