Factors Affecting Microhardness of Ti/TiN Multilayer Films Deposited by Pulsed Bias Arc Ion Plating

Abstract

Ti/TiN multilayer films were deposited on high-speed-steel (HSS) substrates using pulsed-bias arc ion plating. Orthogonal experiments were used to analyze factors affecting microhardness of the films. The results show that of all the pulsed bias related parameters including pulsed bias magnitude, duty ratio, frequency, and film geometry parameters including modulation period, TiN/Ti thickness ratio, and grain size of TiN, the pulsed bias magnitude is the major factor affecting the microhardness. The maximum microhardness of 34.1 GPa was obtained with pulsed bias magnitude 900 V, duty ratio 50%, frequency 30 kHz, and modulation period 84 nm.