Facile low-temperature route toward the development of polymer-supported silica-based membranes for gas separation via atmospheric-pressure plasma-enhanced chemical vapor deposition

Abstract

The use of inexpensive porous polymers instead of conventional ceramics to support silica-based membranes can potentially minimize the cost of membrane synthesis. To develop polymer-supported silica-based membranes, lowering the high synthesis temperature of the silica-based top layer is essential. In this study, we explore the application of atmospheric-pressure plasma-enhanced chemical vapor deposition (AP-PECVD) for synthesizing polymer-supported silica-based membranes. The deposition of a continuous silica-based layer on an asymmetric polysulfone ultrafiltration membrane using hexamethyldisiloxane as an organosilicon precursor was achieved at ambient temperature and pressure via AP-PECVD. The gas permeation properties of the AP-PECVD-derived polymer-supported membranes strongly depended on the deposition duration, as prolonged deposition could reduce the remaining defects by covering the entire surface of the support with the plasma-deposited layer. The membranes showed increased selectivities for H2/N2 and H2/SF6 from 2.9 to 9.5, and from 4.5 to 184, respectively, exhibiting gas permeation dominated by molecular sieving. The present study demonstrates that AP-PECVD is a promising strategy for the fabrication of polymer-supported silica-based membranes for gas separation.