Abstract
The nanocomposite titanium oxides (TiOX) films were grown on the glass substrate using the reactive DC sputtering method. A solid-state disproportionation process led to the development of a multi-phase structure, consisting of nanocrystalline dioxies (TiO2) and suboxides (TinO2n-1) embedded with an amorphous TiO2-δ matrix. As the plasma discharge impedance decreased during the sputtering growth, a sequence of TiO2 crystallites, sesquioxides (Ti2O3), and eventually monoxides (TiO) were formed. This progression came at the expense of compromising the quality of the TiO2 crystallites and resulted in the reduction of oxygen vacancies in the a-TiO2-δ matrix. Furthermore, the frequency-dependent impedance measurements revealed that the metal-insulator nanocomposite TiOx films containing TiO crystallites exhibited a remarkable permittivity above 106 in the frequency range of 102 ∼106 Hz. We believe that the observed colossal permittivity is primarily attributed to the interface polarization within the composite constituents, in addition to the electrode effects.
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