Fabrication Technique for Preparing Nanogap Electrodes by Conventional Silicon Processes

Abstract

A fabrication technique for preparing nanogap electrodes, such as a gold (Au) nano electrode, using conventional silicon (Si) processes–photolithography, etching, thermal oxidation and deposition–is proposed. Stencil substrates are prepared using the Si processes. Then, without requiring complicated technology, nanogap structures can be formed using the technique. Numerous kinds of materials can be selected as an electrode. The mass production of a sensing device for the detection of deoxyribonucleic acid (DNA), or a so-called DNA chip, can be realized at a low cost.