Abstract
Thin-film strain sensors are widely used because of their small volume, fast strain response and high measurement accuracy. Among them, the thin-film material and preparation process of thin-film strain sensors for force measurement are important aspects. In this paper, the preparation process parameters of the transition layer, insulating layer and Ni-Cr alloy layer in a thin-film strain sensor are analyzed and optimized, and the influence of each process parameter on the properties of the thin film are discussed. The surface microstructure of the insulating layer with Al2O3 or Si3N4 transition layers and the film without transition layer were observed by atomic force microscopy. It is analyzed that adding a transition layer between the stainless steel substrate and insulation layer can improve the adhesion and flatness of the insulation layer. The effects of process parameters on elastic modulus, nanohardness and strain sensitivity coefficient of the Ni-Cr resistance layer are discussed, and electrical parameters such as the resistance strain coefficient are analyzed and characterized. The static calibration of the thin-film strain sensor is carried out, and the relationship between the strain value and the output voltage is obtained. The results show that the thin-film strain sensor can obtain the strain generated by the cutting tool and transform it into an electrical signal with good linearity through the bridge, accurately measuring the cutting force.
Highlights
Academic Editor: Niall TaitThe cutting force directly affects the quality of the work-piece and tool life as one of important parameters in metal cutting processes
Before depositing the transition layer, the stainless-steel substrate was subjected to surface treatment to obtain a surface roughness of 30–50 nm, which was ultrasonically cleaned with acetone and absolute alcohol for 20 min. sputtering power, sputtering pressure, and Ar:O2 flow ratio are the main process parameters in the preparation process of Al2 O3 film
The influence degree of the process parameters on the deposition rate of the Si3 N4 insulating layer is followed by sputtering power, gas flow ratio, substrate temperature, and sputtering pressure
Summary
The cutting force directly affects the quality of the work-piece and tool life as one of important parameters in metal cutting processes. Petley et al deposited Ni-Cr alloy thin-films as the sensitive layer film at room temperature using magnetron co-sputtering technology and found that when it contained 80% Ni with 20% Cr it showed the most obvious columnar structure, had the highest resistivity, indentation hardness and elastic modulus, and good mechanical and electrical properties [20]. The effect of the material and technology parameters of the membrane system film on the film quality and performance are analyzed, mechanical and electrical performance of the resistor grid layers are discussed, and the sensor strain coefficient is calibrated by experiments. We can determine the best film materials, optimize the process parameters, improve the performance of the film system and microsensor, and provide technical support for the application of strain film sensors in the measurement of cutting force
Sign-in/Register to view highlights & summary Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
