Abstract
We have perfected a micromachining technology based on microlithography and electroforming for producing uniformly redundant arrays (URA) and Young's slits for coherence measurements in synchrotron radiation beamlines. The structures may act as absorbent objects or as phase objects. Two microfabrication techniques were used. Optical lithography in thin photoresists followed by gold electroforming on silicon nitride membranes produced structures 0.5-2.0 μm thick. Soft x-ray lithography in thick resists using the structures produced by optical lithography as a mask, followed by gold electroforming, produced structures up to 6.3 μm thick. Young's slits, one dimensional (1D), and two dimensional (2D) URA structures with feature sizes as small as 1 μm were produced in this way and used for coherence measurements in the soft and hard x-ray regimes at the Advanced Photon Source.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
