Abstract
In this paper, the author presents a novel noncontact subaperture deterministic figuring method, named numerically controlled local wet etching (NC-LWE), for fabricating ultraprecision optics or finishing functional materials. In this method, a localized wet etching area is formed using a combined nozzle that is composed of a coaxially arranged supply part and a suction part for the etchant. In the system, the removal volume at any point on the workpiece surface is determined by the dwelling time of the nozzle. The author applied this method to finish a photomask substrate made of synthetic quartz glass (6 inches), and achieved 56 nm peak to valley flatness with 0.15 nm rms roughness.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
