Abstract
Magnesium hydroxide (Mg(OH)2) thin films were deposited by the drop-dry deposition (DDD) method using an aqueous solution containing Mg(NO3)2 and NaOH. DDD was performed by dropping the solution on a substrate, heating-drying, and rinsing in water. Effects of different deposition conditions on the surface morphology and optical properties of Mg(OH)2 thin films were researched. Films with a thickness of 1−2 μm were successfully deposited, and the Raman peaks of Mg(OH)2 were observed for them. Their transmittance in the visible range was 95% or more, and the bandgap was about 5.8 eV. It was found that the thin films have resistivity of the order of 105 Ωcm. Thus, the transparent and semiconducting Mg(OH)2 thin films were successfully prepared by DDD.
Highlights
This study focused on magnesium hydroxide (Mg(OH)2 )
By the rinsing process, the contents of the other elements contained in the deposition solution (Na, N) were reduced to below the detection limit of Auger electron spectroscopy (AES)
Mg(OH)2 thin films were prepared by drop-dry deposition using an aqueous solution containing Mg(NO3)2 and NaOH, and their elemental composition and
Summary
Transparent conductive materials (TCMs) have been widely used as electrode materials for transparent electronics devices such as liquid crystal displays and touch panels, and for thin film solar cells. DDD is aa method method of of depositing depositing a thin thin film film by by dropping dropping and drying aa solution. It uses a heating plate onlyonly andand doesdoes not solutionon onthe thesubstrate substrateasasshown showninin not need other apparatuses, vacuum chamber, electric powersupply, supply,ororlight light source.
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