Fabrication of TiAl 3 coating on TiAl-based alloy by Al electrodeposition from dimethylsulfone bath and subsequent annealing

Abstract

TiAl 3 coating was formed on TiAl alloy by Al electrodeposition from a dimethylsulfone (DMSO 2) bath and subsequent annealing. Before the Al electrodeposition, anodic dissolution of TiAl substrate in the DMSO 2 bath was conducted to remove the surface oxide layer of the TiAl substrate. By performing the Al electrodeposition immediately after the anodic dissolution, uniform Al films adherent to the TiAl substrate could be obtained. Annealing at 650–1000 °C yielded a single TiAl 3 layer or two layers of TiAl 3 and TiAl 2 on the TiAl substrate. The resulted TiAl 3 layer was confirmed to show oxidation-resistance at high temperatures.