Fabrication of textured Ni–9.3at.%W substrate by electropulsing intermediate annealing method

Abstract

Sharp cube texture is difficult to obtain in high W content Ni–W alloy substrates used for coated conductors. In this paper, a new method called electropulsing intermediate annealing (EIA) is adopted to optimize the rolling and recrystallization texture of Ni–9.3at.%W substrate. It is found that, compared with conventional intermediate annealing (CIA) at the same temperature, EIA trends to increase the Copper, S and Brass components, suppress the Goss component in rolling texture. Higher cube recrystallization texture is obtained at relatively low temperature by EIA in a shorter time. The effect of EIA on texture is attributed to the enhancement of recovery process resulting from the athermal effects.