Abstract
An efficient fabrication technique for large area periodic metallic split-ring arrays has been demonstrated by the combination of tilted nanoimprint lithography and nanotransfer imprinting. The feature size of the split-rings can be adjusted by varying the key geometry parameters of the original imprinting mold. Due to the flexible nature of PDMS molds, these arrays can be patterned on curved surfaces. The molds for nanoimprint lithography and nanotransfer imprinting can be used multiple times without a loss of fidelity.
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