Abstract
One of the most important thin film deposition techniques on a silicon, quartz or sapphire substrate in the world is the spin coating method. Hematocrit centrifuge was used to elaborately manufacture the spin coating machine from affordable materials without vibrations. The vacuum holder substrate in this system is used for substrate adhesion. This method provides a dimensionally free substrate with appropriate adhesion for sedimentation upon high-speed spinning. A platinum thin film was deposited on a fluorine-doped tin oxide glass (FTO) substrate with a specific concentration of hexa-chloro-platinic acid. Platinum thin films were investigated by Field Emission Scanning Electron Microscope (FESEM) and UV-Vis spectroscopy. FESEM displays successfully produced platinum thin films. The results showed a platinum film transmittance decrement with increasing of hexachloro-platinic acid content. Therefore, the suggested spin coater in this work can deposit platinum thin films with high transmittance up to (98 a.u.).
Highlights
The chemical technique is one of the most methods that is used for fabricating thin films due to its low cost and simple fabrication
Many chemical techniques were developed to be used for depositing thin films, such as dip coating[1], highlighting[2], spray pyrolysis[3], doctor blade[4], and spin coating[5]
This work presented a development of a low-cost spin coater for depositing platinum thin films on an fluorine-doped tin oxide glass (FTO) conductive substrate with different concentrations for dye sensitized solar cells (DSSCs) application
Summary
The chemical technique is one of the most methods that is used for fabricating thin films due to its low cost and simple fabrication. The most fundamental advantage of spin coating over other methods is the production of fast and high quality films without engaging in complex procedures[7,8] This technique is mainly used in the deposition of polymers. Spin coaters can form thin films with thickness in range of micrometers (μm) and nanometer (nm), for application of devices such as, transistors[9], gas sensors[10] and light emitting diodes[11] It can be used for depositing platinum thin films on conductive glass. This work presented a development of a low-cost spin coater for depositing platinum thin films on an FTO conductive substrate with different concentrations for DSSCs application. Materials Research to provide a free dimension substrate with good adhesion at high-speed rotation
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