Fabrication of Solar Cell Based on Copper Oxide Nanostructures Deposited Using Reactive Pulsed Laser Deposition

Abstract

The deposition of copper oxide utilizing a pulsed laser deposition technique employing a reactive pulsed laser as a deposition technique is the subject of this study. The wavelength of the pulsed lase used are 1064 nm, the pulse duration is 10 ns, the laser energy of 1000 mj with different substrate temperatures (200, 3300, and 400 oC). The influence of the substrate tampering on the morphological, structural, Photolumencence, and the electrical, and attributes of the fabricated solar cell was recorded and studied using a high purity cupper target and deposited on porous silicon substrates. When compared to a crystalline silicon surface, the results of AFM show a higher possibility of better absorption and hence lower reflection. The presented results revealed the properties of the fabricated solar cell as well as a noticeable improvement in the solar cell's efficiency, whether copper deposition was used or not. The deposited films at 1064 nm were monoclinic structures with a preference for the (111) direction, according to X-ray diffraction (XRD) examination. SEM were used to study the production of nanostructures on the substrate's surface, which led to the formation of small-sized and nanostructured films.