Abstract
Nanoimprint-lithography-based molybdenum lift-off was applied to fabricate a perovskite-type La0.8Ba0.2MnO3(LBMO) nanodot array on a SrTiO3(100) substrate in combination with an in situ pulsed laser deposition (PLD) technique. We fabricated a Mo/SiOx bilayer mask pattern to prevent the crystallization of the Mo layer even at 700 °C and successfully obtained a LBMO nanodot array with a dot size as small as 200 nm by removing the Mo layer using 0.1 N NaOH aqueous solution.
Full Text 
Sign-in/Register to access full text options
Sign-in/Register to access full text options 
Paper version not known
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a call
