Abstract
A simple, complementary metal-oxide-semiconductor (CMOS)-compatible fabrication technique is developed to demonstrate a robust silicon-on-diamond (SOD) substrate. The 2.5 μm × 700 nm waveguides with a spiral structure are fabricated on both SOD and conventional silicon-on-insulator (SOI) substrates, showing 0.74- and 0.54-dB/cm propagation loss, respectively. Finite element method (FEM) thermal simulation shows over 3× improvement in heat dissipation on a hybrid silicon laser structure when Si substrate is not a limiting factor.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
