Abstract
A controlled, 3D selective inductively coupled plasma reactive ion etching process (ICP-RIE) was employed to fabricate high aspect ratio tiered resonant nanopillars (TR-NPs) made of two Bragg reflectors consisting of a stack of Si3N4/SiO2 alternate layers, a resonant SiO2 central cavity, and nickel caps. The 3D etching process led to a vertical full etching, and also to a horizontal highly selective etching that preserves SiO2 layers while the Si3N4 layers are slowly etched. Resulting TR-NPs periodic arrays were tested as optical sensors and highlighted a 28% increment in bulk sensitivity (379 nm RIU−1) comparing with conventional Si3N4/SiO2 resonant NPs without metal caps (296 nm RIU−1) considering the resonance feature located in the 580-630 nm wavelength range.
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