Fabrication of seamless three-dimensional roll mold using direct electron-beam writing on rotating cylindrical substrate

Abstract

A three-dimensional (3D) seamless roll mold is difficult to fabricate because of its cylindrical shape. However, seamless 3D nanoscale patterns are in great demand for optical film applications and printed electronics. The authors have therefore developed a method for producing a 3D seamless roll mold by direct electron-beam (EB) writing onto a layer of resist material coated on a cylindrical substrate that is rotating in a vacuum. In addition, the 3D shape is produced by using the EB dose change method and the controlled-acceleration-voltage electron beam lithography (CAV-EBL) method developed by the authors. In the case of the EB dose change method, hydrogen silsesquioxane (HSQ), which is a negative-type EB resist, was used for the 3D roll mold. In the case of CAV-EBL, spin on glass, which is a positive-type EB resist, was used for the 3D roll mold. As a result, the developed HSQ height can be controlled by changing the EB dose; however, the dose change also causes a line width change. On the other hand, in the CAV-EBL method, the EB dose and acceleration voltage can be used to control the line width and depth independently; therefore, this method can successfully fabricate the coveted 3D roll mold.