Fabrication of rhodanine self-assembled monolayer thin films on copper: Solvent optimization and corrosion inhibition studies

Abstract

Rhodanine self-assembled monolayer (Rh-SAM) films were prepared on copper specimens in different solvents. The assembled films were characterized using scanning electron microscopy (SEM), energy dispersive X-ray spectroscopy (EDX), atomic force microscopy (AFM), Fourier transform infrared spectroscopy (FT-IR) and contact angle measurements. The inhibition efficiency of the films against copper corrosion in 3.5% NaCl solution was studied using electrochemical impedance spectroscopy (EIS), potantodynamic polarization (PP) and linear polarization resistance (LPR) techniques. It was found that very well-ordered and almost homogenously distributed Rh-SAM films were assembled on the copper surface. The appearance, electrochemical and physical properties of the films were depending on preparation conditions. The SAM films reduce greatly the corrosion rate of copper in 3.5% NaCl solution. Their protection ability depends on the type of solvent. The best film for this aim was obtained in 10 mM Rh after 24 h film formation time when methanol was used as solvent. The high corrosion protection ability of the films was assigned to the formation of a compact and protective structure over the copper surface. Assembling SAM films of this healthy compound and their application for corrosion protection has not been reported yet and is very original.