Abstract
This paper describes a new fabrication technique for RF MEMS switches where the coplanar waveguide (CPW) is fabricated in a basin. A planar profile and good coverage at the edges in a basin is achieved by spinning and baking the sacrificial positive photoresist (PPR) in multiple steps to fill the basin. The basin structure allows an increase in the length of the membrane resulting in lower pull-in voltage and better isolation. The PPR is removed using Piranha solution (H2SO4:H2O2::3:1). Structures with the gap of about 2.5 µm and the thickness of the gold membrane varying from 1µm to 2.5 µm have been successfully realized.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
