Abstract
Highly reflective volume Bragg gratings (R∼80%) were written in Ti:sapphire planar and channel waveguides fabricated via pulsed-laser deposition (PLD) by exposure to UV (266 nm) femtosecond laser irradiation through suitable phase masks. Large photo-induced refractive index modulations of up to ∼1×10−2 were observed, which were completely reversible at temperatures of ∼100°C. The dependence of the refractive index modulation on intensity suggests that the mechanism for grating inscription is an one-photon absorption process. Generation of gratings may result from a charge transfer process between the Ti3+ and Ti4+ ions and/or transient localized structural re-arrangements.
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