Abstract

We have tried to apply the liquid phase epitaxy (LPE) process to fabricate RE123 coated conductors. We have developed the architecture using a BaZrO 3 buffer layer, called “non-reactive buffer type” on a textured Ni substrate. In the previous study, RE123/BaZrO 3/NiO/Ni sample was shown that T c value was about 90 K, however the J c value was lower than 10 3 A/cm 2. In order to increase J c of the film, the perfect coverage on of the BaZrO 3 on the substrate has to be attained. Then, we tried to grow a BaZrO 3 buffer layer directly on a textured Ni substrate without formation of the NiO layer to maintain good in-plane alignment. The alignments of the BaZrO 3 layer and the seed layer become better in this architecture, and the linkage of LPE grains was improved. Consequently, the sample of Y–Yb/BaZrO 3/Ni revealed the T c value of about 90 K and the I c value of 12 A.

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