Abstract
In this work, we carried out an investigation of commercial atomic force microscope (AFM) probes for contact and semi-contact modes, which were modified by focused ion beam (FIB). This method was used to modify the original tip shape of silicon AFM probes, by ion-etching and ion-enhance gas deposition. we show a better performance of the FIB-modified probes in contrast with the non-modified commercial probes. These results were obtained after using both probes in semi-contact mode in a calibration grating sample.
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