Fabrication of porous silicon-based silicon-on-insulator photonic crystal by electrochemical etching method

Abstract

We present a fast, novel method for building porous silicon-based silicon-on-insulator photonic crystals in which a periodic modulation of the refractive index is built by alternating different electrochemical etching currents. The morphology and reflectance spectra of the photonic crystals, prepared by the proposed method, are investigated. The scanning electron micrograph and atomic force microscopy images show a very uniform structure and the porous silicon demonstrates an 829 nm wide photonic band gap.