Abstract
A new fabrication method for realizing ordered nanopillar array is reported in this paper. First, a metallic nanodot array is prepared by combining two techniques, viz., nano-grid patterning by Nanoplastic Forming (NPF) and dot agglomeration by thermal dewetting. These processes do not include complicated and expensive procedures such as electron beam lithography. Then Au-capped nanopillar arrays are produced by reactive ion etching (RIE). In the refractive index sensing application, it is shown that the sensitivity of the Au-capped nanopillar array is higher than that of the Au nanodot array. The plasmonic nanopillar arrays with Ag coating are used as SERS-active substrates, which exhibit good performance.
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