Abstract
Ge20Sb15Se65 chalcogenide glass films were deposited and patterned using maskless projection lithography to create photonic crystal structures. This lithography technology, which is based on a digital micro-mirror device, is demonstrated as a powerful and low-cost tool to produce arbitrary intensity distributions to fabricate photonic devices. Direct photolithography in resist-free chalcogenide films was first studied, and results indicate that the quality of the products is insufficient. High-quality photonic crystals with sub-micrometer size were finally obtained in chalcogenide films with photoresist by maskless projection lithography and inductively coupled plasma technology.
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