Abstract
The interfacial reactions of the 2D-ordered nickel metal nanodots that were prepared by polystyrene nanosphere lithography (NSL) on Si substrates after different heat treatments have been investigated. Epitaxial NiSi 2 nanodot arrays were found to form at a temperature as low as 350 °C. The results indicated that the growth of epitaxial NiSi 2 is more favorable for the Ni metal dot array samples. The sizes of these epitaxial NiSi 2 nanodots in samples annealed at 350–800 °C are in the range of 84–110 nm. The shape of the epitaxial NiSi 2 nanodot was found to be pyramidal. Furthermore, for the samples annealed at 900 °C, amorphous SiO x nanowires were found to grow on individual nickel silicide nanoparticles. The diameters of these nanowires are in the range of 15–20 nm. As the size of metal nanodot can be adjusted by tuning the diameter of the polystyrene (PS) spheres, the NSL technique promises to be an effective patterning method without complex lithography.
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