Abstract
abrication of novel high aspect ratio pillars like Gecko's foot-hairs has been demonstrated by UV nanoimprint lithography using PDMS Template. Si master mold having scalloped structures is prepared by deep Si etching process and the pattern is transferred to PMDS template. The pattern is again transferred to UV resist by UV nanoimprint using replicated PDMS template. Using PDMS template, high aspect ratio pillars with side wall scallops were successfully replicated.
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