Abstract
In this paper, we present a modified nanosphere lithographic scheme that is based on the self-assembly and electroforming techniques. The scheme was demonstrated to fabricate a nickel template of ordered nanobowl arrays together with a nickel nanostructure array-patterned glass substrate. The hemispherical nanobowls exhibit uniform sizes and smooth interior surfaces, and the shallow nanobowls with a flat bottom on the glass substrate are interconnected as a net structure with uniform thickness. A multiphysics model based on the level set method (LSM) was built up to understand this fabricating process by tracking the interface between the growing nickel and the electrolyte. The fabricated nickel nanobowl template can be used as a mold of long lifetime in soft lithography due to the high strength of nickel. The nanostructure–patterned glass substrate can be used in optical and magnetic devices due to their shape effects. This fabrication scheme can also be extended to a wide range of metals and alloys.
Highlights
Ordered nanostructure arrays have attracted considerable attention due to their unique properties and potential applications in such as data storage [1], biosensors [2], catalysis [3], and photonic crystals [4,5]
A high-quality nanoimprint stamp is used in nanoimprinting lithography (NIL) to implement the imprinting, but the stamp fabrication still relies on the aforementioned techniques that are time-consuming and expensive
Nanospheres, materials are deposited onto the substrate by using various deposition techniques, such as chemical vapor deposition (CVD) [7], electroless deposition [8], atomic layer deposition (ALD) [9], and even molecular beam epitaxy (MBE) [10], which is used to deposit single crystals and fabricate quantum dot arrays [11,12]
Summary
Ordered nanostructure arrays have attracted considerable attention due to their unique properties and potential applications in such as data storage [1], biosensors [2], catalysis [3], and photonic crystals [4,5]. Nanospheres, materials are deposited onto the substrate by using various deposition techniques, such as chemical vapor deposition (CVD) [7], electroless deposition [8], atomic layer deposition (ALD) [9], and even molecular beam epitaxy (MBE) [10], which is used to deposit single crystals and fabricate quantum dot arrays [11,12]. Silicon nanopillars were fabricated using self-assembled nanospheres as a mask in combination with the reactive ion etching (RIE) [20,21] or deep RIE techniques [22].
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