Abstract
Scanning probe microscopy (SPM) has drawn increased interest to nanotechnology, as it exhibited lithographic as well as microscopic capabilities. Among several nanosized patterning techniques, such as short-wavelength photolithography, electron beam lithography, and SPM lithography, atomic force microscopy (AFM) anodization lithography is considered a unique technique in the viewpoint of ease of use and permanence. Our group has found that the surfaces having specialized functional groups could also be utilized for AFM anodization lithography, so enhancement in the writing speed of lithography was achieved.
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