Abstract
Three different kinds of imprinting lithography techniques UV curing imprinting, thermally curing imprinting with monomer resin, and hot embossing imprinting with polymer resin were used to transfer as small as 70 nm in patterns of template onto the various substrates including Si wafer, oxidized Si wafer, quartz wafer, glass plate, PET (polyethylene terephthalate) film, ITO (indium tin oxide) coated PET, and Al foil. High fidelity pattern transferring was observed in all cases. It is shown that nano-imprinting lithography is one of the most promising techniques to fabricate nanosize patterns on various substrates.
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