Abstract
In this paper we report an improved three-step wet etching method to achieve individual nanopore and nanopore arrays at wafer scale. Nanopore arrays and individual nanopores with feature size down to 14nm were obtained. To improve the precise control of the pore-opening point, we used a home-made device to monitor the traversing current, which presents pore-opening event. The uniformity of the nanopore arrays have also been analyzed.
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